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CHARACTERIZATION OF PULSED LASER DEPOSITED ZNO FILMS: INFLUENCE OF LASER AND BEAM PROFILE AT 532 AND 1064 NM

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dc.contributor.authorPadilla Rueda, Diana Johannaspa
dc.contributor.authorVadillo Pérez, José Miguelspa
dc.contributor.authorLaserna Vásquez, José Javierspa
dc.date.accessioned2016-05-16 00:00:00
dc.date.accessioned2022-06-17T20:19:07Z
dc.date.available2016-05-16 00:00:00
dc.date.available2022-06-17T20:19:07Z
dc.date.issued2016-05-16
dc.description.abstractZnO thin films have been elaborated using a pulsed laser deposition (PLD) technique onto glass substrate at room temperature. The PLD process is developed in oxygen atmosphere (1*10-1 mbar). The morphology, chemical composition and optical characteristics were studied as function of laser wavelength and laser profile (532 and 1064 nm). Film properties are strongly influenced by the Gaussian profile to flat top shaped laser beam at 532 nm and 1064 nm. At regardless of laser wavelength, films prepared with flat top profile exhibit smooth surface and preferential growth direction (101), it is detected reduction of the density defects like interstitial or vacancies atoms. The optical band gap, the ratio intensity visible/UV fluorescence and peak position are modified in agree with the degradation of film stoichiometry. At regardless of the laser wavelength, the use of Gaussian beam stimulates the highest deposition rate; the surface roughness and clusters density are incremented. Films show a polycrystalline structure (100, 002 and 101). The optical band gap is modified, film stoichiometry is higher than flat top films, in agree with the fluorescence measurements. We demonstrated a simple, fast and low cost setup to elaborate ZnO films with tailored properties. These films could be used to applications in short wavelength optoelectronic devices, optical or electric sensors, also for the elaboration of nanowires using different types of substrates.spa
dc.description.abstractZnO thin films have been elaborated using a pulsed laser deposition (PLD) technique onto glass substrate at room temperature. The PLD process is developed in oxygen atmosphere (1*10-1 mbar). The morphology, chemical composition and optical characteristics were studied as function of laser wavelength and laser profile (532 and 1064 nm). Film properties are strongly influenced by the Gaussian profile to flat top shaped laser beam at 532 nm and 1064 nm. At regardless of laser wavelength, films prepared with flat top profile exhibit smooth surface and preferential growth direction (101), it is detected reduction of the density defects like interstitial or vacancies atoms. The optical band gap, the ratio intensity visible/UV fluorescence and peak position are modified in agree with the degradation of film stoichiometry. At regardless of the laser wavelength, the use of Gaussian beam stimulates the highest deposition rate; the surface roughness and clusters density are incremented. Films show a polycrystalline structure (100, 002 and 101). The optical band gap is modified, film stoichiometry is higher than flat top films, in agree with the fluorescence measurements. We demonstrated a simple, fast and low cost setup to elaborate ZnO films with tailored properties. These films could be used to applications in short wavelength optoelectronic devices, optical or electric sensors, also for the elaboration of nanowires using different types of substrates.eng
dc.format.mimetypeapplication/pdfspa
dc.identifier.doi10.24050/reia.v12i2.959
dc.identifier.eissn2463-0950
dc.identifier.issn1794-1237
dc.identifier.urihttps://repository.eia.edu.co/handle/11190/4972
dc.identifier.urlhttps://doi.org/10.24050/reia.v12i2.959
dc.language.isospaspa
dc.publisherFondo Editorial EIA - Universidad EIAspa
dc.relation.bitstreamhttps://revistas.eia.edu.co/index.php/reveia/article/download/959/859
dc.relation.citationeditionNúm. 2 , Año 2016 : Edición especial Nanociencia y Nanotecnología 2spa
dc.relation.citationendpage34
dc.relation.citationissue2spa
dc.relation.citationstartpage27
dc.relation.citationvolume12spa
dc.relation.ispartofjournalRevista EIAspa
dc.rightsRevista EIA - 2016spa
dc.rights.accessrightsinfo:eu-repo/semantics/openAccessspa
dc.rights.coarhttp://purl.org/coar/access_right/c_abf2spa
dc.rights.creativecommonsEsta obra está bajo una licencia internacional Creative Commons Atribución-NoComercial-SinDerivadas 4.0.spa
dc.rights.urihttps://creativecommons.org/licenses/by-nc-nd/4.0spa
dc.sourcehttps://revistas.eia.edu.co/index.php/reveia/article/view/959spa
dc.subjectZnO filmspa
dc.subjectPulsed laser depositionspa
dc.subjectRoom temperature filmsspa
dc.subjectFilm characterizationspa
dc.subjectLaser beam shapespa
dc.titleCHARACTERIZATION OF PULSED LASER DEPOSITED ZNO FILMS: INFLUENCE OF LASER AND BEAM PROFILE AT 532 AND 1064 NMspa
dc.title.translatedCHARACTERIZATION OF PULSED LASER DEPOSITED ZNO FILMS: INFLUENCE OF LASER AND BEAM PROFILE AT 532 AND 1064 NMeng
dc.typeArtículo de revistaspa
dc.typeJournal articleeng
dc.type.coarhttp://purl.org/coar/resource_type/c_6501spa
dc.type.coarhttp://purl.org/coar/resource_type/c_6501spa
dc.type.coarversionhttp://purl.org/coar/version/c_970fb48d4fbd8a85spa
dc.type.contentTextspa
dc.type.driverinfo:eu-repo/semantics/articlespa
dc.type.redcolhttp://purl.org/redcol/resource_type/ARTREFspa
dc.type.versioninfo:eu-repo/semantics/publishedVersionspa
dspace.entity.typePublication
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